Olympus BX51M Instructions Manual - Page 27
Browse online or download pdf Instructions Manual for Microscope Olympus BX51M. Olympus BX51M 36 pages. System metallurgical microscope
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OPTICAL CHARACTERISTICS «UIS2 (UIS) Series»
-- The UIS series objectives that are not mentioned below can also be mounted on this microscope. --
The table below shows the optical characteristics of different eyepiece
and objective combinations. Objective specifications are marked on
the objective (as shown in the diagram on the right).
NOTE
Refer to the latest catalogue or consult Olympus for the updated infor-
mation on the eyepieces and objectives that can be combined with
this unit.
characteristics
Series
Marking
MPLN
MPlanN
UIS2
Plan Achromat
series
(FN22)
MPLN-BD
MPlanN-BD
Brightfield/
darkfield
Plan Achromat
(FN22)
MPLFLN
MPlanFLN
Plan Semi-
Apochromat
(FN26.5)
*1.25X:FN22
MPLFLN-BD
MPlanFLN-BD
Brightfield/
darkfield
Plan Semi-
Apochromat
(FN26.5)
MPLFLN-BDP
MPlanFLN-BDP
Reflected Polarized
Light Plan Semi-
Apochromat
(FN26.5)
LMPLFLN
LMPlanFLN
Long-WD Plan
Semi-Apochromat
(FN26.5)
LMPLFLN-BD
LMPlanFLN-BD
Brightfield/darkfield
long-WD Plan Semi-
Apochromat
(FN26.5)
Note) When an MPLN-BD series objective is used in darkfield observation with a xenon light source, the peripheral area
may be obscured with certain specimens.
Optical
Magnifi-
W.D.
N.A.
cation
(mm)
5X 0.10
20.0
10X 0.25
10.6
20X 0.40
1.3
50X 0.75
0.38
100X 0.90
0.21
5X 0.10
12.0
10X 0.25
6.5
20X 0.40
1.3
50X 0.75
0.38
100X 0.90
0.21
1.25X 0.04
3.5
2.5X 0.08
10.7
5X 0.15
20.0
10X 0.30
11.0
20X 0.45
3.1
50X 0.80
1.0
100X 0.90
1.0
5X 0.15
12.0
10X 0.30
6.5
20X 0.45
3.0
50X 0.80
1.0
100X 0.90
1.0
150X 0.90
1.0
5X 0.15
12.0
10X 0.25
6.5
20X 0.40
3.0
50X 0.75
1.0
100X 0.90
1.0
5X 0.13
22.5
10X 0.25
21.0
20X 0.40
12.0
50X 0.50
10.6
100X 0.80
3.4
5X 0.13
15.0
10X 0.25
10.0
20X 0.40
12.0
50X 0.50
10.6
100X 0.80
3.3
Magnification
UIS marking
Cover glass thickness
—: May be used with our with-
out a cover glass.
0: Used without a cover glass.
Cover
glass
Resolu-
WHN10X (FN22)
thick
tion
Depth
ness
Total
(µm)
of focus
(mm)
mag.
(µm)
—
3.36
50X
98
—
1.34
100X
18
0
0.84
200X
6.1
0
0.45
500X
1.4
0
0.37
1000X 0.73
—
3.36
50X
98
—
1.34
100X
18
0
0.84
200X
6.1
0
0.45
500X
1.4
0
0.37
1000X 0.73
—
8.39
12.5X 870
—
4.19
25X 220
—
2.24
50X
59
—
1.12
100X
15
0
0.75
200X
5.2
0
0.42
500X
1.3
0
0.37
1000X 0.73
—
2.24
50X
59
—
1.12
100X
15
0
0.75
200X
5.2
0
0.42
500X
1.3
0
0.37
1000X 0.73
0
0.37
1500X
0.6
—
2.24
50X
59
—
1.34
100X
18
0
0.84
200X
6.1
0
0.45
500X
1.4
0
0.37
1000X 0.73
—
2.58
50X
70
—
1.34
100X
18
0
0.84
200X
6.1
0
0.67
500X
2.5
0
0.42
1000X 0.87
—
2.58
50X
70
—
1.34
100X
18
0
0.84
200X
6.1
0
0.67
500X
2.5
0
0.42
1000X 0.87
BX51M
Objective series
(PL = Plan)
NA (Numerical Aperture)
Brightfield/darkfield
application
FN (Field Number)
Eyepieces
SWH10X (FN26.5)
Field
Depth
Field
Total
of view
of focus
of view
mag.
(mm)
(µm)
(mm)
4.4
2.2
1.1
—
—
0.44
0.22
4.4
2.2
1.1
—
—
0.44
0.22
17.6
—
—
8.8
25X 220
10.6
4.4
50X
59
5.3
2.2
100X
15
2.65
1.1
200X
5.2
1.33
0.44
500X
1.3
0.53
0.22
1000X 0.73
0.27
4.4
50X
59
5.3
2.2
100X
15
2.65
1.1
200X
5.2
1.33
0.44
500X
1.3
0.53
0.22
1000X 0.73
0.27
0.15
1500X
0.6
0.18
4.4
50X
59
5.3
2.2
100X
18
2.65
1.1
200X
6.1
1.33
0.44
500X
1.4
0.53
0.22
1000X 0.73
0.27
4.4
50X
70
5.3
2.2
100X
18
2.65
1.1
200X
6.1
1.33
0.44
500X
2.5
0.53
0.22
1000X 0.87
0.27
4.4
50X
70
5.3
2.2
100X
18
2.65
1.1
200X
6.1
1.33
0.44
500X
2.5
0.53
0.22
1000X 0.87
0.27
—
—
—
24